US 2026/0085413 A1 · SEMICONDUCTOR MANUFACTURING APPARATUS AND A METHOD FOR MANUFACTURING OF A SEMICONDUCTOR

Abstract

An apparatus and method is disclosed. The apparatus having: a reaction chamber; one or more gas inlets connected to said reaction chamber to provide precursor gas into said reaction chamber; and; an accumulator connected to at least one of said one or more gas inlets. The apparatus having three evaporators/condensers, a first evaporator/condenser connectable with the accumulator and constructed to be heated to provide sublimated/evaporated precursor to the reaction chamber via the accumulator; a second evaporator/condenser connectable to a bulk precursor storage constructed to be cooled to deposit precursor from the heated storage in it; and a third evaporator/condenser connectable between an exhaust of the reaction chamber and a pump and to be constructed to be cooled to deposit precursor from the exhaust before it reaches the pump.

Claims20

Dependent claims

A semiconductor manufacturing apparatus, the apparatus comprising:

a reaction chamber;
one or more gas inlets connected to said reaction chamber to provide precursor into said reaction chamber;
and;
an accumulator connected to at least one of said one or more gas inlets;
wherein the apparatus comprises three evaporators/condensers, a first evaporator/condenser connectable with the accumulator and constructed to be heated to provide sublimated/evaporated precursor to the reaction chamber via the accumulator;
a second evaporator/condenser connectable to a bulk precursor storage and constructed to be cooled to deposit precursor in it from the bulk precursor storage when the storage is heated;
and a third evaporator/condenser connectable between an exhaust of the reaction chamber and a pump and constructed to be cooled to deposit precursor from the exhaust before it reaches the pump.

4 more elements

A method for manufacturing of a semiconductor with a semiconductor manufacturing apparatus comprising:

a reaction chamber for loading a substrate;
one or more gas inlets connected to said reaction chamber to provide precursor into said reaction chamber to deposit a layer on the substrate;
an accumulator connected to at least one of said one or more gas inlets;
the method comprising:
connecting a first evaporator/condenser with the accumulator and heating the first evaporator/condenser to provide evaporated precursor to the reaction chamber via the accumulator;
connecting a second evaporator/condenser to a bulk precursor storage and heating the bulk precursor storage while cooling the second evaporator/condenser to deposit precursor from the storage in the second evaporator/condenser;
and,
connecting a third evaporator/condenser between an exhaust of the reaction chamber and a pump and cooling the third evaporator/condenser to deposit precursor from the exhaust in the third evaporator/condenser before it reaches the pump.

5 more elements

Dependencies are inferred from the claim text.

Semiconductor manufacturing apparatus and a method for manufacturing of a semiconductor

Life of this patent

Semiconductor manufacturing apparatus and a method for manufacturing of a semiconductor

Life of this patent

Abstract

Claims20