Polishing surface dressing method and method of manufacturing substrate
AssigneeDisco Corporation
InventorsMami SAEKI, Jiro GENOZONO, Yuto MAEDA, Ryotaro HINATA, Takamasa SUZUKI
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AssigneeDisco Corporation
InventorsMami SAEKI, Jiro GENOZONO, Yuto MAEDA, Ryotaro HINATA, Takamasa SUZUKI
Estimating the term…
A polishing surface dressing method includes: a dressing step of dressing a polishing surface; a polishing surface shape measuring step of measuring the shape of the polishing surface based on a displacement amount in a first direction orthogonal to the polishing surface and a movement position in the second direction of the dressing section that is in contact with the polishing surface; a determination step of determining appropriateness of the shape of the polishing surface measured in the polishing surface shape measuring step; and a condition change step of changing a contact condition in which the dressing section makes contact with the polishing surface in the dressing step, when the shape of the polishing surface is determined to be “No Good”, and the dressing step is performed again based on the contact condition changed in the condition change step.
A polishing surface dressing method comprising dressing a polishing surface of a polishing pad of a polishing apparatus by a dressing section of a dressing mechanism,
Dependencies are inferred from the claim text.