Gas Separation Membranes
AssigneesFujifilm Manufacturing Europe B.V., FUJIFILM Corporation
InventorsPetrus Henricus Maria Van Kessel, Yujiro Itami
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Abstract
A gas separation membrane comprising: (i) a porous substrate; (ii) a gutter layer comprising a cross-linked polysiloxane polymer; (iii) a discriminating layer comprising at least 60 w/w % of ethylene oxide (EO) groups and at least 0.15 mmol/g of thioether groups; and (iv) a protective layer comprising a cross-linked polysiloxane polymer; wherein: (a) the gutter layer has an average thickness of less than 2.5 μm; (b) the discriminating layer has an average thickness of greater than 0.2 μm and less than 5 μm; and (c) the protective layer has an average thickness of at least 0.4 μm.
Claims8
1-9. (canceled)
A gas separation membrane comprising:
- (i) a porous substrate;
- (ii) a gutter layer comprising a cross-linked polysiloxane polymer;
- (iii) a discriminating layer comprising at least 60 w/w % of ethylene oxide (EO) groups and at least 0.15 mmol/g of thioether groups of the formula —CH2—S—CH2—;
- and
- (iv) a protective layer comprising a cross-linked polysiloxane polymer;
- wherein:
- (a) the gutter layer has an average thickness of less than 2.5 μm;
- and
- (b) the discriminating layer has an average thickness of greater than 0.2 μm and less than 5 μm;
- (c) the protective layer has an average thickness of 800 nm to 2000 nm.
Dependencies are inferred from the claim text.