Manufacturing method of connecting structure and package structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTsung-Fu Tsai, Jian-Yang He, Ying-Ching Shih, Szu-Wei Lu
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTsung-Fu Tsai, Jian-Yang He, Ying-Ching Shih, Szu-Wei Lu
Estimating the term…
A structure including a substrate having a conductive pad and a connecting structure disposed on the conductive pad and electrically connected to the conductive pad. The connecting structure includes a first metallic layer disposed on the conductive pad, a first intermetallic compound layer disposed on the first metallic layer, a second intermetallic compound layer disposed on the first intermetallic compound layer and a second metallic layer disposed on the second intermetallic compound layer. The first metallic layer comprises copper. The first intermetallic compound layer comprises a first intermetallic compound. The second intermetallic compound layer comprises a second intermetallic compound different from the first intermetallic compound. The second metallic layer comprises tin. The first intermetallic compound contains copper, tin and one of nickel and cobalt.
A method for forming a connecting structure, comprising:
A method for forming a connecting structure, comprising:
A method, comprising:
Dependencies are inferred from the claim text.