US 2026/0076146 A1 · APPARATUS FOR PROCESSING SUPERCRITICAL SUBSTRATE

Abstract

The present invention relates to an apparatus for processing supercritical substrate comprising: a chamber having a processing space; a substrate supporting unit for supporting a substrate; an opening/closing unit for opening or closing the processing space; a loading/unloading unit for loading a substrate into or unloading the substrate from the substrate supporting unit; a detection unit for detecting the loading/unloading unit or the substrate; and a control unit for controlling the opening/closing unit, wherein the control unit controls the operation of the opening/closing unit in response to the detection unit detecting the loading/unloading unit or the substrate.

Claims8

Dependent claims

An apparatus for processing supercritical substrate comprising:

a chamber having a processing space;
a substrate supporting unit for supporting a substrate;
an opening/closing unit for opening or closing the processing space;
a loading/unloading unit for loading a substrate into or unloading the substrate from the substrate supporting unit;
a detection unit for detecting the loading/unloading unit or the substrate;
and
a control unit for controlling the opening/closing unit,
wherein the control unit controls the operation of the opening/closing unit in response to the detection unit detecting the loading/unloading unit or the substrate.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application

19/297,566Filed 12 Aug 2025

Priority

KR 10-2024-01219486 Sep 2024

Published

12 Mar 2026

Term ends

Not estimatedThe source records don’t support an estimate.

Classification6 codes

H10P 72/3411
The wafers being stored in a carrier, involving loading and unloading: involving loading and unloading of wafers
H10P 72/0408
For cleaning followed by drying, rinsing, stripping, blasting or the like: for drying
H10P 72/0606
Apparatus for monitoring, sorting, marking, testing or measuring: position monitoring, e.g. misposition detection or presence detection
H10P 72/3406
The wafers being stored in a carrier, involving loading and unloading: involving removal of lid, door or cover

Apparatus for processing supercritical substrate

Life of this patent

Apparatus for processing supercritical substrate

Life of this patent

Abstract

Claims8