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US 2026/0076138 A1Published application
Substrate processing apparatus
OwnerSungHoon Jun, ByeongPil Parkinventors
Life of this patent
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Abstract
A top lid capable of minimizing thermal deformation when a substrate processing temperature increases includes a support for supporting the top lid, the support protruding integrally from one surface of the top lid.
Claims20
A top lid mounted on an upper end of a chamber of a substrate processing apparatus, the top lid comprising:
- a support protruding integrally from one surface of the top lid,
- wherein the top lid and the support are a single piece.
A substrate processing apparatus comprising:
- a chamber having an inner space;
- a top lid coupled to an upper end of the chamber;
- at least one substrate support installed in the inner space of the chamber;
- and
- one or more gas supply units configured to supply a process gas to a substrate,
- wherein a support for supporting the top lid is formed to protrude from one surface of the top lid, the support comprising:
- one or more holes penetrating the top lid in a vertical direction;
- and
- a step formed at an inner edge of the one or more holes,
- wherein each of the one or more gas supply units is seated on the step of one of the one or more holes,
- wherein the top lid and the support are integrally formed as a single piece.
8 more elements
Dependencies are inferred from the claim text.