Semiconductor reaction chamber and semiconductor processing apparatus and methods

A semiconductor reaction chamber comprising:

• an inner chamber for processing a workpiece;
• an electrostatic chuck including a functional layer and a base body and arranged in the inner chamber for placing the workpiece, the functional layer fixed on the base body;
• an accommodation chamber under the functional layer and surrounded by the functional layer and the base body, the accommodation chamber isolated from the inner chamber;
• an air inflation device for supplying a gas to the accommodation chamber;
• an air extraction device for extracting the gas from the accommodation chamber;
• and
• a chamber controller including a processor and a memory for storing computer programs that, when being executed, cause the processor to perform:
• monitoring a first pressure in the inner chamber;
• monitoring a second pressure in the accommodation chamber;
• and
• in response to detection of a pressure difference between the first pressure and the second pressure greater than a threshold value, adjusting the second pressure in the accommodation chamber to reduce the pressure difference through the air inflation device or the air extraction device.

A method for a semiconductor reaction chamber including an inner chamber and an accommodation chamber, comprising:

• monitoring a first pressure in the inner chamber, wherein the inner chamber is arranged for processing a workpiece, an electrostatic chuck is disposed in the inner chamber for placing the workpiece and includes a functional layer and a base body, and the functional layer is fixed on the base body;
• monitoring a second pressure in the accommodation chamber, wherein the accommodation chamber is arranged under the functional layer and surrounded by the functional layer and the base body, and the accommodation chamber is isolated from the inner chamber;
• supplying a gas from a gas source to the accommodation chamber through an air inflation device;
• extracting the gas from the accommodation chamber through an air extraction device;
• and
• adjusting the second pressure to reduce a pressure difference between the first pressure and the second pressure by adjusting a flow rate of the gas through the air inflation device.