Oled front-plane mask reduction
OwnerYu-Hsin LIN, Chung-Chia CHEN +2inventors
InventorsYu-Hsin LIN, Chung-Chia CHEN, Ji Young CHOUNG, Sheng-Wen WANG
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OwnerYu-Hsin LIN, Chung-Chia CHEN +2inventors
InventorsYu-Hsin LIN, Chung-Chia CHEN, Ji Young CHOUNG, Sheng-Wen WANG
Estimating the term…
The present disclosure provides methods including disposing a plurality of metal layers over a substrate. The plurality of metal layers include a plurality of first sub-layers, a plurality of second sub-layers, and a plurality of third sub-layers. The methods include disposing the plurality of first sub-layers over the substrate. The second plurality of sub-layers are disposed over the plurality of first sub-layers. The third plurality of sub-layers are disposed over the plurality of second sub-layers. The plurality of first sub-layers include a first thickness. The plurality of second sub-layers include a second thickness. The plurality of third sub-layers include a third thickness. A supplemental material is disposed over the plurality of third sub-layers. A first resist is disposed over the supplemental material. An opening of the supplemental material is formed to expose a surface of a third sub-layer of the plurality of third sub-layers. The supplemental material is annealed.
A method, the method comprising:
A method, the method comprising:
A method, the method comprising:
Dependencies are inferred from the claim text.