Display device and method of fabricating the same

A method of fabricating a display device, the method comprising:

• preparing a substrate and forming a first conductive layer disposed on the substrate, a buffer layer disposed on the first conductive layer, active layers disposed on the buffer layer, and a second conductive layer disposed on the active layers;
• forming a passivation layer disposed on the second conductive layer and the active layers;
• forming a via layer disposed on the passivation layer and a bank pattern layer disposed on the via layer and forming contact holes penetrating the bank pattern layer, the via layer and the passivation layer;
• and
• forming a third conductive layer that comprises a first electrode disposed on the bank pattern layer and a second electrode spaced apart from the first electrode and placing light emitting elements on the first electrode and the second electrode, wherein
• the passivation layer comprises silicon nitride (SiNx), and
• a ratio of a number of silicon-hydrogen bonds (Si—H) to a number of nitrogen-hydrogen bonds (N—H) in the silicon nitride (SiNx) is in a range of about 1:0.6 to about 1:1.5.