Susceptor assembly and substrate processing apparatus
AssigneeTes Co., Ltd
InventorsWook-Hee LEE, Sung-Cheol KIM
Life of this patent
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Abstract
A susceptor assembly is configured to support a substrate and to regulate a temperature of the substrate. The susceptor assembly comprises a susceptor on which the substrate is seated. The susceptor is configured to cool or heat the substrate and to supply levitational gas toward the substrate. A substrate processing apparatus is provided to include the susceptor assembly, along with a chamber forming a processing space for the substrate and a gas supply unit provided in the chamber to supply process gas toward the substrate.
Claims10
A susceptor assembly configured to support a substrate and to regulate a temperature of the substrate, the susceptor assembly comprising:
- a susceptor on which the substrate is seated, the susceptor being configured to cool or heat the substrate and to supply levitational gas toward the substrate.
A substrate processing apparatus comprising:
- a chamber configured to provide a processing space for a substrate;
- a gas supply unit provided in an upper portion of an interior of the chamber and configured to supply process gas toward the substrate;
- and
- a susceptor assembly provided in the interior of the chamber and configured to allow the substrate to be seated thereon,
- wherein the susceptor assembly includes:
- a susceptor on which the substrate is seated, the susceptor being configured to cool or heat the substrate and to supply levitational gas toward the substrate;
- two or more zone heaters embedded in the susceptor and configured to heat the substrate;
- and
- a cooling path disposed between the zone heaters and configured to allow cooling fluid to flow therethrough to cool the substrate.
Dependencies are inferred from the claim text.