Back to results
US 2026/0074151 A1Published application
Uniform pixelated microwave plasma source with substrate rotation
AssigneeApplied Materials, Inc.
InventorsJOSEPH AUBUCHON, TZA-JING GUNG
Life of this patent
Estimating the term…
Abstract
Embodiments described herein relate to an apparatus that includes a dielectric plate, and a plurality of dielectric resonators coupled to the dielectric plate. In an embodiment, the plurality of dielectric resonators are distributed across the dielectric plate in a pattern that is asymmetric in order to provide a plasma uniform flux density to an underlying substrate as the substrate is rotated.
Claims20
An apparatus, comprising:
- a dielectric plate;
- and
- a plurality of dielectric resonators coupled to the dielectric plate, wherein the plurality of dielectric resonators are distributed across the dielectric plate in a pattern that is asymmetric.
An apparatus, comprising:
- a chamber;
- a microwave plasma source coupled to the chamber, wherein the microwave plasma source comprises a plurality of dielectric resonators that are distributed over a dielectric plate, and wherein a pattern of the plurality of dielectric resonators does not include an axis of symmetry;
- and
- a pedestal within the chamber, wherein the pedestal is configured to be rotated.
1 more element
A method, comprising:
- rotating a substrate on a pedestal within a chamber that comprises a microwave plasma source with a plurality of dielectric resonators that are distributed across the chamber in a pattern that does not have an axis of symmetry;
- and
- processing the substrate with a plasma induced by the plurality of dielectric resonators while the substrate is rotated.
Dependencies are inferred from the claim text.