Pulsing rf coils of a plasma chamber in reverse synchronization

A method comprising:

• generating a first radio frequency (RF) signal to provide a parameter of the first RF signal to a first RF coil, the first RF coil configured to be situated above a substrate support of a plasma chamber;
• generating a second RF signal to provide the parameter of the second RF signal to a second RF coil, the second RF coil configured to be situated above an edge ring of the plasma chamber;
• and
• pulsing the parameter of the second RF signal in reverse synchronization with the parameter of the first RF signal.

A method for reverse pulsing of radio frequency (RF) coils, comprising:

• receiving an indication of a multiplexing operation of a first RF generator and a second RF generator, the first RF generator is configured to be coupled to a first RF coil and the second RF generator is configured to be coupled to a second RF coil;
• receiving a selection indicating that the first RF generator is to start operating in a state;
• receiving a duty cycle of operation of the first RF generator;
• controlling the first RF generator to have the duty cycle and to start operating in the state, the first RF generator controlled to generate a first RF signal;
• and
• controlling the second RF generator to operate in reverse synchronization with the first RF generator, the second RF generator is controlled to operate in reverse synchronization with the first RF generator to cause the second RF generator to pulse a second RF signal in reverse synchronization with the first RF signal.