Defect detection using multiple algorithms

A non-transitory computer readable medium comprising instructions that, when executed by one or more processing circuitries, cause the one or more processing circuitries to perform:

• obtaining a first set of candidate defects of a semiconductor specimen, wherein the first set of candidate defects has been obtained based on at least one image of the semiconductor specimen acquired by an inspection tool associated with a first set of acquisition parameters,
• using one or more first algorithms to generate, based on the first set of candidate defects, a first reduced set of candidate defects, comprising less candidate defects than the first set of candidate defects,
• obtaining a second set of candidate defects of the semiconductor specimen, wherein the second set of candidate defects has been obtained based on at least one image of the semiconductor specimen acquired by the inspection tool associated with a second set of acquisition parameters, different from the first set of acquisition parameters,
• using the one or more first algorithms to generate, based on the second set of candidate defects, a second reduced set of candidate defects, comprising less candidate defects than the second set of candidate defects, and
• feeding at least part of the first reduced set of candidate defects and at least part of the second reduced set of candidate defects to a second algorithm, to generate a unified set of candidate defects.