Substrate processing apparatus

Abstract

According to an embodiment, a substrate processing apparatus includes a mounting unit that includes a mounting table capable of mounting a substrate thereon, and rotates the substrate mounted on the mounting table, a cooling unit that supplies a cooling gas into a space between the mounting table and the substrate through a cooling gas nozzle, and a liquid supply unit that supplies a liquid to a surface of the substrate opposite to a surface of the mounting table. The cooling gas nozzle has at least one first nozzle hole that is inclined in a direction away from a rotational center axis of the substrate as approaching the substrate.

Dependencies are inferred from the claim text.