US 2026/0066239 A1 · PLASMA SOURCE WITH INTEGRATED CHAMBER LINER

Abstract

Embodiments described herein relate to an apparatus that includes a source assembly with a first surface and a second surface opposite from the first surface. In an embodiment, a liner is coupled to the first surface of the source assembly. In an embodiment, the liner includes a first liner over at least a portion of the first surface, and a second liner that extends away from the first liner. In an embodiment, the second liner includes a ring shape, and the first liner and the second liner are a monolithic structure.

Claims20

Dependent claims

An apparatus, comprising:

a source assembly with a first surface and a second surface opposite from the first surface;
and
a liner coupled to the first surface of the source assembly, wherein the liner comprises:
a first liner over at least a portion of the first surface;
and
a second liner that extends away from the first liner, wherein the second liner comprises a ring shape, and wherein the first liner and the second liner are a monolithic structure.

3 more elements

Dependencies are inferred from the claim text.

Facts

Application

18/823,431Filed 3 Sep 2024

Published

5 Mar 2026

Term ends

Not estimatedThe source records don’t support an estimate.

Classification7 codes

H01J 37/32495
Characterised by the means for protecting vessels or internal parts, e.g. coatings: means for protecting the vessel against plasma
H01J 37/32477
Vessel: characterised by the means for protecting vessels or internal parts, e.g. coatings
H01J 37/32513
Vessel: sealing means, e.g. sealing between different parts of the vessel
H01J 37/32522
Vessel: temperature

Plasma source with integrated chamber liner

Life of this patent

Plasma source with integrated chamber liner

Life of this patent

Abstract

Claims20