Euv mask particle removing methods and systems
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsLi-Chun HUNG, Chia-Shih LIN, Chien-Hung LAI
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsLi-Chun HUNG, Chia-Shih LIN, Chien-Hung LAI
Estimating the term…
A method for removing contaminant particles on a surface of a mask includes collecting an image of the mask with the contaminant particles on the surface of the mask, and determining a type of the contaminant particles based on the image of the mask. The method further includes performing a particle-removing process corresponding to the type of the contaminant particles on the surface of the mask, and determining if the contaminant particles are removed from the surface of the mask by the particle-removing process. The method also includes associating the particle-removing process with the type of the contaminant particles when the contaminant particles are removed from the surface of the mask by the particle-removing process.
A method for removing contaminant particles on a surface of a mask, comprising:
A method for removing contaminant particles on a surface of a mask, comprising:
An apparatus for removing contaminant particles on a surface of a mask, comprising:
Dependencies are inferred from the claim text.