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AssigneeKLA Corporation
InventorsAndrew V. Hill, Ido Dolev, Daria Negri, Oren Lahav
Estimating the term…
A metrology system for imaging samples such as semiconductor devices having metrology targets for measuring overlay. In embodiments, a multi-channel imaging system is configured to image two relevant spaced layers of a sample simultaneously at the same magnification using a common detector. In embodiments, the multi-channel imaging system includes a first imaging light for imaging the metrology target at a first depth, and a second imaging light for imaging the metrology target at a second depth, wherein the first and second imaging lights are generating by splitting collected light from the sample, and wherein first and second sub-images associated with the respective first and second imaging lights are used to generate metrology measurements.
A metrology system comprising:
A metrology system comprising:
A metrology method comprising:
Dependencies are inferred from the claim text.