Back to results
US 2026/0064013 A1Published application
Process control for dose, focus, and overlay using weighting maps based on spatial process kpis
AssigneeKLA Corporation
InventorPhilip Groeger
Life of this patent
Estimating the term…
Abstract
A modeled correction may be generated based on metrology measurements and a weighting map. Residuals between the modeled correction and the metrology measurements may be weighted according to the weighting map. The modeled correction may be weighed via the weighting map according to a position at which the metrology measurements were generated on a sample. The modeled correction may include dose, focus, and overlay. A process tool may be controlled based on the modeled correction to control the dose, focus, and overlay.
Claims20
A controller of a metrology system, the controller comprising:
- one or more processors configured to execute program instructions causing the one or more processors to:
- receive one or more metrology measurements of a sample;
- generate a weighting map associated with the sample, wherein the weighting map spatially varies across the sample;
- and
- generate a modeled correction based on the one or more metrology measurements and the weighting map, wherein the modeled correction is weighed via the weighting map according to a position at which the one or more metrology measurements were generated on the sample.
2 more elements
A metrology system comprising:
- a controller comprising:
- one or more processors configured to execute program instructions causing the one or more processors to:
- receive one or more metrology measurements of a sample;
- generate a weighting map associated with the sample, wherein the weighting map spatially varies across the sample;
- and
- generate a modeled correction based on the one or more metrology measurements and the weighting map, wherein the modeled correction is weighed via the weighting map according to a position at which the one or more metrology measurements were generated on the sample.
3 more elements
A method comprising:
- receiving one or more metrology measurements of a sample;
- generating a weighting map associated with the sample, wherein the weighting map spatially varies across the sample;
- and
- generating a modeled correction based on the one or more metrology measurements and the weighting map, wherein the modeled correction is weighed via the weighting map according to a position at which the one or more metrology measurements were generated on the sample.
1 more element
Dependencies are inferred from the claim text.