Layout of circuit structure and method for forming circuit structure

A method for forming a circuit structure, comprising:

• decomposing an original layout into a first layout and a second layout, wherein the first layout and the second layout respectively comprise a plurality of feature patterns;
• identifying a first pattern-to-cut in the first layout, wherein the first pattern-to-cut comprises a plurality of contiguous connected segments;
• based on a selecting rule, selecting a first selected segment among the segments of the first pattern-to-cut;
• inserting a first cut pattern to the first selected segment;
• after subtracting the first cut pattern from the first pattern-to-cut, outputting the first layout to a first photomask, and outputting the second layout and the first cut pattern to a second photomask;
• and
• using the first photomask and the second photomask to perform a double patterning process to form the circuit structure on a substrate.