Method for training opc modeling parameter

A method for training an OPC modeling parameter, comprising the following steps:

• step 1:
• collecting OPC modeling data, comprising:
• designing a plurality of OPC patterns according to a design requirement for a lithography process layer layout;
• selecting at least one model parameter as a selected model parameter requiring training, and setting a plurality of different values for each selected model parameter;
• and
• collecting wafer pattern data formed by performing a lithography process on each OPC pattern based on different values of the selected model parameter;
• step 2:
• generating a sample unit and a sample set based on the collected data;
• step 3:
• inputting data of the sample set into a neural network for training;
• and
• step 4:
• performing OPC modeling using the trained neural network, wherein during the OPC modeling, an optimal value of the selected model parameter is obtained using the trained neural network, and the optimal value of the selected model parameter is used to perform the OPC modeling.