Euv light source device for euv mask inspection

An extreme ultraviolet (EUV) light source device for EUV mask inspection, comprising:

• an infrared (IR) laser source for emitting an IR laser beam;
• a condenser lens for collecting the IR laser beam emitted from the IR laser source;
• a collector mirror having a hole formed at the center thereof in such a way as to pass the IR laser beam collected onto the condenser lens therethrough, the collector mirror being adapted to collect EUV light reflected onto a liquid target if the IR laser beam reacts with the liquid target to produce the EUV light;
• a target feeder for continuously feeding the liquid target to allow the IR laser beam passing through the hole formed on the collector mirror to react with the liquid target;
• and
• a plurality of heaters located on the collector mirror to heat and evaporate liquid target contaminants deposited on the surface of the collector mirror.