Extreme ultra-violet lithography system having sensor module

An extreme ultra-violet (EUV) lithography system comprising:

• a source module which generates an extreme ultra-violet light;
• a first optical system which includes a field facet mirror that collects the extreme ultra-violet light and a pupil facet mirror that transmits the extreme ultra-violet light transmitted from the field facet mirror to a reticle, the field facet mirror including a plurality of first mirrors, and the pupil facet mirror including a plurality of second mirrors;
• a second optical system which transmits the extreme ultra-violet light reflected from the reticle to a substrate;
• a sensor module which is disposed on a substrate stage that supports the substrate, and which generates a first image representing an intensity distribution of the extreme ultra-violet light;
• and
• a processor configured to:
• perform a Fourier transform on the first image to generate a second image representing a first pupil region having a first center point and a plurality of second center points;
• and
• measure an intensity of the extreme ultra-violet light mapped to each of the plurality of second mirrors from the first center point,
• wherein the plurality of second center points are associated with the plurality of second mirrors.

An extreme ultra-violet (EUV) lithography system comprising:

• a source module which generates an extreme ultra-violet light;
• an optical module which transfers a pattern onto a substrate, using the extreme ultra-violet light,
• the optical module including:
• a collector which collects and reflects the extreme ultra-violet light generated from the source module,
• an illumination optical system which includes a field facet mirror including a plurality of first mirrors that reflects the extreme ultra-violet light emitted from the collector, and a pupil facet mirror including a plurality of second mirrors that transmit the extreme ultra-violet light transmitted from the field facet mirror to a reticle, and
• a projection optical system which transmits the extreme ultra-violet light reflected from the reticle to the substrate;
• a sensor module which is disposed on a substrate stage that supports the substrate, and which generates a first image on an intensity distribution of the extreme ultra-violet light;
• and
• a processor configured to perform a Fourier transformation on the first image to generate a second image representing a first pupil region defined by a first center point and a plurality of second center points,
• wherein the plurality of second center points are associated with centers of the plurality of second mirrors,
• wherein the first center point corresponds to a center of the first pupil region, and
• wherein the processor is configured further to measure an intensity of the extreme ultra-violet light mapped to the plurality of second mirrors, using the first center point.