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US 2026/0063995 A1Published application
Semiconductor photoresist compositions and methods of forming patterns using the compositions
AssigneeSamsung SDI Co., Ltd.
InventorsChungheon LEE, Minyoung LEE, Jihyun YOON, Yaeun SEO, Seongyeon HWANG, Taegeun SEONG, Minhye KIM
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Abstract
A semiconductor photoresist composition includes an organometallic compound; an organic solvent including a ketone-based solvent; and an organic acid compound. A method of forming patterns using the same is disclosed.
Claims20
A semiconductor photoresist composition, comprising:
- an organometallic compound;
- an organic solvent comprising a ketone-based solvent;
- and
- an organic acid compound.
1 more element
Dependencies are inferred from the claim text.