Semiconductor photoresist composition and method of forming patterns using the composition

A semiconductor photoresist composition, comprising:

• an organometallic compound;
• a compound represented by Chemical Formula 1;
• and
• a solvent:
• wherein, in Chemical Formula 1,
• R1 is hydrogen, a hydroxyl group, a thiol group, a carboxyl group, a guanidyl group, an amide group, an amino group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C6 to C20 arylamine group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C2 to C20 heteroaryl group, or a combination thereof,
• R2 to R4 are each independently hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C7 to C20 arylalkyl group, or a combination thereof, and
• L1 is a single bond or a substituted or unsubstituted C1 to C10 alkylene group.