Method of supplying raw material gas, apparatus for supplying raw material gas, and apparatus for forming film on substrate
AssigneeTokyo Electron Limited
InventorTakeshi ITATANI
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorTakeshi ITATANI
Estimating the term…
A method of supplying a raw material gas includes: supplying a power to at least one heater provided at a raw material container in which a solid raw material is accommodated and heating an inside of the raw material container to sublimate the solid raw material; supplying a carrier gas to the raw material container being heated by the heater and mixing the carrier gas with the sublimated solid raw material to supply a mixed gas as the raw material gas to a consumption zone in which a substrate is disposed; and acquiring an index value having a corresponding relationship with a remaining amount of the solid raw material, wherein, in sublimating the solid raw material, a power corresponding to the index value is supplied to the heater, based on a corresponding relationship between the index value, which is preset, and the power supplied to the heater.
A method of supplying a raw material gas, comprising:
An apparatus for supplying a raw material gas, comprising:
Dependencies are inferred from the claim text.