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US 2026/0060029 A1Published application
Substrate processing apparatus
AssigneeSCREEN Holdings Co., Ltd.
InventorShota IWAHATA
Life of this patent
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Abstract
A substrate processing apparatus includes a chamber, a collection pipe, and a collection unit. In the chamber, a mixed solution of a chemical solution and an organic solvent acts on a main surface of a substrate. The collection pipe includes an upstream end portion connected to the chamber. The mixed solution from the chamber flows in the collection pipe. The collection unit includes a separation membrane separating the chemical solution from the mixed solution supplied through the collection pipe to increase a concentration of the organic solvent in the mixed solution.
Claims4
A substrate processing apparatus, comprising:
- a chamber in which a mixed solution of a chemical solution and an organic solvent acts on a main surface of a substrate;
- a collection pipe, with an upstream end portion connected to the chamber, into which the mixed solution from the chamber flows;
- and
- a collection unit including a separation membrane separating the chemical solution from the mixed solution supplied through the collection pipe to increase a concentration of the organic solvent in the mixed solution.
1 more element
Dependencies are inferred from the claim text.