Methods for filling recessed features on a substrate with a flowable layer structure
AssigneeASM IP Holding B.V.
InventorsLeonard Rodriguez, Mihaela Balseanu
Life of this patent
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Abstract
Methods for filling a recessed feature on a substrate are disclosed. The methods disclosed include depositing a flowable layer structure on the substrate and heating the flowable layer structure above the glass transition temperature of the flowable layer structure. Methods for depositing the flowable layer structure include depositing an aluminum oxide based flowable layer structure employing atomic layer deposition processes.
Claims20
A method for filling a recessed feature on a substrate disposed within a reaction chamber, the method comprising:
- depositing a flowable layer structure on the substrate by performing a plurality of deposition super-cycles of an atomic layer deposition process, each one of the plurality of deposition super-cycles comprising:
- performing one or more first sub-cycles of a first ALD process to deposit an aluminum oxide layer, each one of the one or more first sub-cycles comprising:
- introducing an aluminum precursor into the reaction chamber;
- and introducing a first oxygen reactant into the reaction chamber;
- and
- performing one or more second sub-cycles of a second ALD process to deposit a doping metal oxide layer, each one of the one or more second sub-cycles comprising:
- introducing one or more dopant precursors;
- and introducing a second oxygen reactant, wherein the one or more dopant precursors comprise a doping element having an oxidation state equal to the oxidation state of aluminum and an ionic radius different to that of aluminum;
- and
- heating the flowable layer structure at a temperature equal to or greater than the glass transition temperature of the flowable layer structure.
A method for filling a recessed feature on a substrate with a flowable layer structure, the method comprising:
- performing an atomic layer deposition (ALD) process for depositing a super-lattice structure comprising two or more repeated aluminum silicate (AlSixOy)/doping metal oxide (MOz) bilayers, the ALD process comprising a deposition super-cycle comprising alternately and sequentially performing one or more first sub-cycles and one or more second sub-cycles;
- wherein each cycle of the first sub-cycles comprises alternately and sequentially contacting the substrate with an aluminum precursor, a silicon precursor, and a first oxygen precursor;
- wherein each cycle of the second sub-cycles comprises alternatively and sequentially contacting the substrate with a dopant precursor and a second oxygen reactant;
- and
- wherein adjacent AlSixOy/MOz bilayers in the super-lattice structure are deposited employing a different dopant precursor such each of the adjacent AlSixOy/MOz bilayers comprises a doping element that is different, having a different ionic radius and a different coordination number;
- and
- heating the flowable layer structure at a temperature equal to or greater than the glass transition temperature of the flowable layer structure.
A method for filling a recessed feature on a substrate disposed within a reaction chamber, the method comprising:
- depositing a flowable doped aluminum silicate (AlSixOy) layer structure at least partially within the recessed feature of the substrate, the doped AlSixOy structure comprising:
- an initial AlSixOy layer,
- a super-lattice structure disposed on the initial AlSixOy layer and comprising two or more repeated AlSixOy/metal oxide (MOz) bilayers, wherein adjacent metal oxide (MOz) layers in the super-lattice structure each comprise a different doping element having a different ionic radius and a different coordination number;
- and
- a capping AlSixOy layer disposed on the super-lattice structure;
- and
- heating the flowable doped aluminum silicate (AlSixOy) layer structure above a glass transition temperature of the flowable doped aluminum silicate (AlSixOy) layer structure in an environment comprising water vapor to induce reflow of the flowable doped aluminum silicate (AlSixOy) layer structure thereby at least partially filling the recessed feature.
Dependencies are inferred from the claim text.