Substrate processing apparatus

Abstract

A substrate processing apparatus comprises: an inner tube (100) forming a processing space (S1) in which a plurality of substrates are stacked and processed in a vertical direction ; a heater unit (200) installed to surround at least a portion of the inner tube (100) to form a heating space (S2) between itself and the inner tube (100), and generating heat by receiving power from outside ; and an outer tube (300) in which the heater unit (200) is disposed to form an internal space (S3) between itself and the heater unit (200), and having at least one openable/closable opening (302) formed on a side thereof to allow external access to the internal space (S3), wherein the heater unit (200) is electrically connected to a power supply unit (700) that transfers power through the outer tube (300) at a position corresponding to the opening (302).

Dependencies are inferred from the claim text.