Spacer fabrics analogous structures and production techniques thereof
AssigneeTechnion Research & Development Foundation Limited
InventorYoav STERMAN
Life of this patent
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Abstract
A multilayered structure is disclosed comprising an alternating stack of one or more wavy layer patterns and one or more flipped wavy layer patterns stacked one on top of the other, to thereby form between anterior and posterior sides of the multilayered structure a plurality of “X”-shaped connections and a plurality of holes in anterior and posterior sides of the multilayered structure.
Claims21
1-36. (canceled)
A multilayered structure comprising an alternating stack of one or more wavy layer patterns and one or more flipped wavy layer patterns stacked one on top of the other, to thereby form between anterior and posterior sides of said multilayered structure a plurality of “X”-shaped connections and a plurality of holes in anterior and posterior sides of said multilayered structure.
A method for forming a spacer fabric analogous structure, the method comprising:
- defining a plurality of curves along a desired mesh geometry;
- offsetting a copy of said plurality of curves a predefined distance and removing segments of the plurality of curves and their offset copy to form alternating gaps therein;
- manipulating remaining segments of said curves and adding connection lines for connecting each edge of said segments with an adjacently located edge of a nearby and oppositely located segment, to thereby form a plurality of wavy layer patterns;
- and generating instruction for a 3D extruder or printer for drawing a curable material accordingly to form said plurality of wavy layers for fabrication of said spacer fabric analogous structure.
Dependencies are inferred from the claim text.