Target generation device, extreme ultraviolet light generation system, and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating extreme ultraviolet light using an extreme ultraviolet light generation system;
• outputting the extreme ultraviolet light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device,
• the extreme ultraviolet light generation system including:
• a target generation device including:
• a nozzle including a nozzle hole through which a liquid target substance for generating the extreme ultraviolet light is discharged,
• a first piezoelectric element arranged at a different position in a first direction with respect to the nozzle, and configured to vibrate the nozzle by expanding and contracting in the first direction, and
• a second piezoelectric element arranged at a different position in the first direction with respect to the first piezoelectric element, and configured to vibrate the nozzle via the first piezoelectric element by expanding and contracting in the first direction;
• a laser device configured to irradiate the target substance discharged from the nozzle with laser light;
• and
• an EUV light concentrating mirror configured to concentrate the extreme ultraviolet light generated by irradiating the target substance with the laser light.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask with extreme ultraviolet light generated by an extreme ultraviolet light generation system;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• extreme ultraviolet light generation system the including:
• a target generation device including:
• a nozzle including a nozzle hole through which a liquid target substance for generating the extreme ultraviolet light is discharged,
• a first piezoelectric element arranged at a different position in a first direction with respect to the nozzle, and configured to vibrate the nozzle by expanding and contracting in the first direction, and
• a second piezoelectric element arranged at a different position in the first direction with respect to the first piezoelectric element, and configured to vibrate the nozzle via the first piezoelectric element by expanding and contracting in the first direction;
• a laser device configured to irradiate the target substance discharged from the nozzle with laser light;
• and
• an EUV light concentrating mirror configured to concentrate the extreme ultraviolet light generated by irradiating the target substance with the laser light.