Deposition apparatus and method of maintaining the same
AssigneesSamsung Display Co., Ltd., Ulvac, Inc.
InventorsKYUNGHOON CHUNG, SHINJIRO KURAHASHI, HIDEKI IIJIMA, KAZUHIKO KOIZUMI, JUNGSEOB LEE, YONGSIC JEON, HYEONSIK KIM, YONG YEO
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Abstract
A deposition apparatus includes a process chamber that provides a space to process a substrate, and including a side surface in which an opening is defined, a door configured to open or close the opening of the process chamber, and a deposition source configured to supply a deposition material to the substrate in the process chamber, and including an upper surface of which at least a portion is exposed through the opening when the opening is opened by the door.
Claims20
A deposition apparatus comprising:
- a process chamber that provides a space to process a substrate, and comprises a side surface in which an opening is defined;
- a door configured to open or close the opening of the process chamber;
- and
- a deposition source configured to supply a deposition material to the substrate in the process chamber, and comprising an upper surface of which at least a portion is exposed through the opening when the opening is opened by the door.
A deposition apparatus comprising:
- a process chamber that provides a space to process a substrate, and comprising a side surface in which an opening is defined;
- a door configured to open or close the opening of the process chamber, and having a width which gradually decreases from an upper portion of the door to a lower portion of the door in a cross-sectional view;
- and
- a deposition source configured to supply a deposition material to the substrate in the process chamber.
A method of maintaining the deposition apparatus, the method comprising:
- moving a deposition source configured to supply a deposition material to a substrate in a process chamber toward a door contacting a side surface of the process chamber;
- opening an opening defined in the side surface of the process chamber by using the door;
- and
- replacing a target object provided in the process chamber through the opening at an outside of the process chamber.
Dependencies are inferred from the claim text.