Treatment liquid and method for treating object to be treated

Abstract

An object of the present invention is to provide a treatment liquid for a semiconductor device, which is excellent in performance of suppressing surface roughness of a metal film containing cobalt, and a treatment method for an object to be treated, using the treatment liquid. The treatment liquid of the present invention is a treatment liquid for a semiconductor device, the treatment liquid containing water, a first component which is an alicyclic heterocyclic compound containing a nitrogen atom as a ring member atom, and a second component which is a compound different from the first component and is an alicyclic heterocyclic compound having a hydroxyl group.

Dependencies are inferred from the claim text.