Back to results
US 2026/0028529 A1Published application
Etching compositions
AssigneeFujifilm Electronic Materials U.S.A., Inc.
InventorsKohei Hayashi, Tomonori Takahashi
Life of this patent
Estimating the term…
Abstract
The present disclosure provides etching compositions that can selectively etch TiN in the presence of a variety of other layers, such as, for example, W, AlOx, and interlayer dielectrics (ILD).
Claims25
An etching composition, comprising:
- 1) at least one oxidizing agent;
- 2) at least one chelating agent;
- 3) at least one metal corrosion inhibitor;
- 4) at least one pH adjusting agent, wherein the pH adjusting agent is aminoalcohol;
- and
- 5) water;
- wherein the composition has a pH less than about 7.
4 more elements
Dependencies are inferred from the claim text.