Semiconductor device
AssigneeRohm Co., Ltd.
InventorNobutaka OI
Life of this patent
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AssigneeRohm Co., Ltd.
InventorNobutaka OI
Estimating the term…
A semiconductor device includes a drift region of a first conductivity type that is formed in an interior of a chip and a plurality of FLRs that are formed in a surface layer portion of a first principal surface in an outer peripheral region such as to surround an active region, each FLR has FLR curve portions, each being of a curve shape in plan view shape, in four corner portions, each FLR has FLR rectilinear portions, each being of a rectilinear shape in plan view shape, between the four corner portions, and each FLR curve portion has a double-diffused structure including a first diffusion region at an inner side and a second diffusion region at an outer side that is lower in impurity concentration of a second conductivity type than the first diffusion region.
A semiconductor device comprising:
Dependencies are inferred from the claim text.