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US 2026/0018384 A1Published application
Shower plate and substrate processing apparatus
AssigneeTokyo Electron Limited
InventorKazuki HOSHI
Life of this patent
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Abstract
A shower plate includes a base that is an integrally formed body including a plurality of gas flow channels therein. Each of the plurality of gas flow channels includes a first portion extending in a thickness direction of the base, and a second portion communicating with the first portion and extending in a direction orthogonal to the thickness direction. Second portions belonging to different gas flow channels of the plurality of gas flow channels are arranged at mutually different positions in the thickness direction.
Claims15
A shower plate comprising:
- a base that is an integrally formed body including a plurality of gas flow channels therein, wherein
- each of the plurality of gas flow channels includes
- a first portion extending in a thickness direction of the base, and
- a second portion communicating with the first portion and extending in a direction orthogonal to the thickness direction, and
- second portions belonging to different gas flow channels of the plurality of gas flow channels are arranged at mutually different positions in the thickness direction.
2 more elements
Dependencies are inferred from the claim text.