Heat treatment apparatus and heat treatment method
AssigneeSiliconware Precision Industries Co., Ltd.
InventorsChun-Hao CHI, Hsi-Chih CHEN, Ling-Fei CHENG, Hsun-Yung CHO, Ming-Jen LIN
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AssigneeSiliconware Precision Industries Co., Ltd.
InventorsChun-Hao CHI, Hsi-Chih CHEN, Ling-Fei CHENG, Hsun-Yung CHO, Ming-Jen LIN
Estimating the term…
A heat treatment apparatus and a heat treatment method are provided, in which at least a semiconductor device is disposed in the heat treatment apparatus, and a waste heat generated during a heat treatment process is exhausted through a heat exhaust pipe of the heat treatment apparatus, and a thermal energy of the waste heat is converted into an electrical energy using a thermoelectric conversion device disposed on the heat exhaust pipe. By using a gas pipe connecting the heat exhaust pipe of the heat treatment apparatus and a machine of the heat treatment apparatus, a gas is preheated using the waste heat and then supplied to the machine of the heat treatment apparatus, thereby reusing the waste heat.
A heat treatment apparatus, comprising:
A heat treatment method, comprising:
Dependencies are inferred from the claim text.