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AssigneesNational Institute for Materials Science, TANAKA PRECIOUS METAL TECHNOLOGIES Co., Ltd.
InventorsTakayuki HARADA, Yasushi MASAHIRO
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A palladium cobalt oxide thin film, a delafossite-type oxide thin film, a Schottky electrode having a delafossite-type oxide thin film, a method for producing a palladium cobalt oxide thin film, and a method for producing a delafossite-type oxide thin film are provided. In the palladium cobalt oxide thin film, the crystal grain size in the film is 100 nm or more and 500 nm or less, the thickness is greater than the critical film thickness, and the roughness value in the thickness direction is 4 nm or less.
A palladium cobalt oxide thin film, wherein a crystal width in the film is 100 nm or more and 1000 nm or less, a film thickness is greater than a critical film thickness, and a roughness value in a thickness direction is 4 nm or less.
A delafossite-type oxide thin film comprising palladium chromium oxide (PdCrO2), palladium rhodium oxide (PdRhO2), or platinum cobalt oxide (PtCoO2) having a delafossite-type crystal structure,
A Schottky electrode comprising a delafossite-type oxide thin film of palladium cobalt oxide (PdCoO2), palladium chromium oxide (PdCrO2), palladium rhodium oxide (PdRhO2), or platinum cobalt oxide (PtCoO2), wherein a crystal grain size in the film is 100 nm or more and 1000 nm or less, a film thickness is greater than a critical film thickness, and a roughness value in a thickness direction is 4 nm or less.
A method for producing a palladium cobalt oxide thin film comprising:
A method of forming a delafossite-type oxide thin film comprising:
Dependencies are inferred from the claim text.