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US 2026/0010074 A1Published application
Onium salt monomer, polymer, chemically amplified negative resist composition, and resist pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorMasahiro Fukushima
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Abstract
Provided are an onium salt monomer which has excellent etching resistance, organic solvent solubility, and appropriate acid strength, and can generate an acid with low diffusion, a base polymer comprising a polymer-bonded acid generator using the same, a chemically amplified negative resist composition using the same, and a resist pattern forming process using the chemically amplified negative resist composition. An onium salt monomer has the formula (A1):
Claims19
An onium salt monomer having the formula (A1):
- wherein n1 is 0 or 1, n2 is 0, 1, 2, 3, or 4,
- RA is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group,
- R1 is a C1-C20 hydrocarbyl group which may contain a halogen atom, a nitro group, a cyano group, a hydroxy group, or a heteroatom, when n2 is 2 or more, a plurality of R1 may bond together to form a ring with the carbon atoms to which they are attached,
- XA is a single bond, —O—, or —N(H)—,
- Q1 to Q3 are each independently a hydrogen atom, a fluorine atom, or a trifluoromethyl group, and
- Z+ is an onium cation.
3 more elements
Dependencies are inferred from the claim text.