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US 2026/0008079 A1Published application
Carbon film formation method and carbon film formation apparatus
AssigneeTokyo Electron Limited
InventorsKeisuke YOSHIDA, Yasuhiro HAMADA, Yuuji KATAGIRI
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Abstract
A carbon film formation method includes applying a carbon film raw material onto a substrate using a spin coating method to form a carbon-containing film on the substrate, and heating and firing the carbon-containing film to form a carbon film, and irradiating the carbon film with helium ions.
Claims12
A carbon film formation method, comprising:
- applying a carbon film raw material onto a substrate using a spin coating method to form a carbon-containing film on the substrate, and heating and firing the carbon-containing film to form a carbon film;
- and
- irradiating the carbon film with helium ions.
A carbon film formation apparatus, comprising:
- a spin coater configured to apply a carbon film raw material onto a substrate using a spin coating method to form a carbon-containing film on the substrate;
- a heating/firing part configured to heat and fire the carbon-containing film to form a carbon film;
- and
- an ion irradiator configured to irradiate the carbon film with helium ions.
1 more element
Dependencies are inferred from the claim text.