US 2026/0005022 A1 · SPIN ON CARBON HARDMASK COMPOSITIONS WITH LOW EVAPORATION LOSS AND PATTERNING METHOD BY USING THE SAME

Abstract

The objective is to provide a spin-on hardmask composition exhibiting a small evaporation loss and being suitable for use in a semiconductor photolithography process which means to provide a composition containing a polymer represented by Formula 1, a surfactant, and an organic solvent and a patterning method using the same composition. The hardmask produced by the method has the effect of a yield improvement with excellent heat resistance by minimizing evaporation loss which is a cause of defects in a process.

Claims13

Dependent claims

A spin-on carbon hardmask composition comprising a polymer having a structure represented by Formula 1 shown below and having a weight average molecular weight in a range of 1,500 to 20,000, the composition exhibiting a small evaporation loss when baked at a temperature of 400° C.

wherein in Formula 1, m and n are in ranges of 1≤m≤50 and 1≤n≤50, respectively,
R1 comprises any one of
and
R2 comprises any one of

1 more element

Dependencies are inferred from the claim text.

Facts

Application

18/559,791Filed 3 May 2022

Priority

KR 10-2021-006310217 May 2021

Published

1 Jan 2026

Term ends

Not estimatedThe source records don’t support an estimate.

Classification17 codes

C08G 61/02
Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule: macromolecular compounds…
H10P 76/204
Of masks comprising organic materials: of organic photoresist masks
C08L 65/00
Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in
C09D 165/00
Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon

Spin on carbon hardmask compositions with low evaporation loss and patterning method by using the same

Life of this patent

Spin on carbon hardmask compositions with low evaporation loss and patterning method by using the same

Life of this patent

Abstract

Claims13