Base material and method for producing structure including phase-separated structure
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsJunichi Tsuchiya, Ryutaro Sugawara
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AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsJunichi Tsuchiya, Ryutaro Sugawara
Estimating the term…
A base material capable of forming a phase-separated structure excellent in horizontal orientation. The base material contains a block copolymer including a block (A1) having a constituent unit represented by the following Formula (a1) and a block (A2) having a constituent unit represented by the following Formula (a2), and a molar ratio of the constituent unit of the block (A2) of more than 0 mol % and 40 mol % or less. In Formula (a1), Ra11 represents a hydrogen atom, Ra12 represents a substituent, and n is an integer of 0 to 5; and in Formula (a2), Ra21 represents a hydrogen atom, L1 represents a single bond, and Y1 represents a divalent linking group having 1 to 15 carbon atoms
A base material for bringing a block copolymer-containing layer to phase separation, the base material comprising:
Dependencies are inferred from the claim text.