Photomask cleaning apparatus
AssigneeGudeng Equipment Co., Ltd.
InventorsChung-Lin Lee, Lin-Hsin Tu, Wei-Yun Chen, Fang-Yin Jhu, Ming-Mo Lo, Hung-Che Lai
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AssigneeGudeng Equipment Co., Ltd.
InventorsChung-Lin Lee, Lin-Hsin Tu, Wei-Yun Chen, Fang-Yin Jhu, Ming-Mo Lo, Hung-Che Lai
Estimating the term…
A photomask cleaning apparatus with a preferred static elimination function includes a cleaning device, a bearing base, an input tube and an output tube. The bearing base is disposed adjacent to the cleaning device and adapted to hold a photomask. The input tube is connected to the cleaning device, and adapted to guide ultrapure water with dissolved carbon dioxide towards the cleaning device for cleaning the photomask. The output tube is connected to the cleaning device, and adapted to drain the ultrapure water with the dissolved carbon dioxide for removing residual static electricity from the photomask.
A photomask cleaning apparatus with a preferred static elimination function comprising:
Dependencies are inferred from the claim text.