Method and apparatus for holding substrate
AssigneeORC Manufacturing Co., Ltd.
InventorsShuichi SHIMIZU, Fumiya SUZUKI
Life of this patent
Estimating the term…
Abstract
An Apparatus for holding a substrate includes a table, a lifting and lowering mechanism configured to mount a substrate on the table, at least one pressing member configured to press the substrate to the table from the peripheral side of the substrate, the pressing member being movable upward and downward, at least one detector configured to detect a warp of the substrate mounted on the table from the peripheral side of the substrate, and a controller configured to control a movement of the pressing member in accordance to the detected warp.
Claims13
An apparatus for holding a substrate, comprising:
- a table;
- a lifting and lowering mechanism configured to mount a substrate on said table;
- at least one pressing member configured to press the substrate toward said table from the peripheral side of the substrate, said pressing member being movable upward and downward;
- at least one detector configured to detect a warp of the substrate mounted on said table from the peripheral side of the substrate;
- and
- a controller configured to control a movement of said pressing member in accordance to the detected warp.
An apparatus for holding a substrate, comprising:
- a table;
- a lifting and lowering mechanism configured to mount a substrate on said table;
- at least one pressing member configured to press the substrate toward said table from the peripheral side of the substrate, said pressing member being movable upward and downward;
- at least one detector configured to detect a warp of the substrate mounted on said table;
- and
- a controller configured to control a movement of said pressing member, said controller changing a starting position of said pressing member for pressing the substrate in accordance to the content of the warp.
A laser processing unit, comprising:
- a table;
- a lifting and lowering mechanism configured to mount a substrate on said table;
- at least one pressing member configured to press the substrate toward said table from the peripheral side of the substrate, said pressing member being movable upward and downward;
- at least one detector configured to detect a warp of the substrate mounted on said table from the peripheral side of the substrate;
- and
- a controller configured to control a movement of said pressing member in accordance to the detected warp.
An exposure unit, comprising:
- a table;
- a lifting and lowering mechanism configured to mount a substrate on said table;
- at least one pressing member configured to press the substrate toward said table from the peripheral side of the substrate, said pressing member being movable upward and downward;
- at least one detector configured to detect a warp of the substrate mounted on said table from the peripheral side of the substrate;
- and
- a controller configured to control a movement of said pressing member in accordance to the detected warp.
A method for holding a substrate, comprising:
- mounting a substrate on a table by a lifting and lowering mechanism;
- detecting a warp of the substrate mounted on said table from the peripheral side of the substrate based on emission and absorption of light;
- pressing the substrate toward said table from the peripheral side of the substrate by a pressing member configured to be movable upward and downward;
- and
- controlling a movement of said pressing member in accordance to the detected warp.
A method for holding a substrate comprising:
- mounting a substrate on a table by a lifting and lowering mechanism;
- detecting a warp of the substrate mounted on said table based on emission and absorption of light;
- pressing the substrate toward said table from the peripheral side of the substrate by a pressing member configured to be movable upward and downward;
- controlling a movement of said pressing member in accordance to the detected warp;
- and
- changing a starting position of said pressing member for pressing the substrate in accordance to the content of the warp.
Dependencies are inferred from the claim text.