Dispensing nozzle design and dispensing method thereof

A lithography apparatus for semiconductor manufacturing, comprising:

• a wafer chuck configured to support a wafer;
• a fluid source configured to contain a fluid selected from a photoresist or a photoresist developer;
• a delivery conduit in fluid communication with the fluid source;
• and
• a dispensing outlet positioned above the wafer chuck, the dispensing outlet including a plurality of orifices, each of the orifices having a different cross-sectional shape, the dispensing outlet including a main tube having one end coupled to a plurality of branch tubes, each of the branch tubes in fluid communication with a corresponding one of the orifices, and the main tube having another end coupled to the delivery conduit.

A lithography apparatus for semiconductor manufacturing, comprising:

• a wafer chuck configured to support a wafer;
• a fluid source configured to contain a fluid selected from a photoresist or a photoresist developer;
• a delivery conduit in fluid communication with the fluid source;
• a dispensing outlet positioned above the wafer chuck, the dispensing outlet including a plurality of orifices, each of the orifices having a different cross-sectional shape, the dispensing outlet including a plurality of branch tubes, each of the branch tubes having one end coupled to a corresponding one of the orifices and another end that can be individually latched to the delivery conduit;
• and
• a movable mechanism to shift the delivery conduit to latch to a selected one of the branch tubes.