Bottom antireflective coating materials
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChien-Chih Chen, Ching-Yu Chang
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Abstract
A method according to the present disclosure includes depositing a material layer over a substrate using a solution. The solution includes a polymeric backbone, a fluorine-containing group directly bonded to the polymeric backbone, a polar group directly bonded to the polymeric backbone, and a photoresist affinity group directly bonded to the polymeric backbone. The method further includes curing the material layer, depositing a photoresist layer over the cured material layer, exposing a portion of the photoresist layer to a radiation source, and developing the photoresist layer.
Claims20
A method, comprising:
- depositing a material layer over a substrate using a solution, wherein the solution comprises:
- a polymeric backbone,
- a fluorine-containing group directly bonded to the polymeric backbone,
- a polar group directly bonded to the polymeric backbone, and
- a photoresist affinity group directly bonded to the polymeric backbone;
- curing the material layer;
- depositing a photoresist layer over the cured material layer;
- exposing a portion of the photoresist layer to a radiation source;
- and
- developing the photoresist layer.
A method, comprising:
- depositing a material layer over a substrate, wherein the material layer comprises:
- a polymer backbone,
- a fluorine-containing group bonded to the polymer backbone, and
- a photoresist affinity group separately bonded to the polymer backbone;
- performing a bake process to the material layer;
- deposit a photoresist layer over the material layer;
- radiating a first portion of the photoresist layer without radiating a second portion of the photoresist layer;
- and
- performing a developing process to the photoresist layer,
- wherein the photoresist affinity group comprises —I, —Br, —Cl, —NH2, —COOH, —OH, —SH, —N3, —S(═O)—, alkene, alkyne, imine, ester, aldehyde, ketone, amide, sulfone, acetic acid, cyanide, or a combination thereof.
A method, comprising:
- providing a solution comprising:
- a polymeric backbone,
- a fluorine-containing group, a polar group, and a photoresist affinity group separately bonded to the polymeric backbone,
- a crosslinker,
- a photoacid generator, and
- a thermal acid generator (TAG);
- and
- curing the solution to form a bottom antireflective coating (BARC) layer,
- wherein curing the solution activates the TAG to generate an acidic moiety.
Dependencies are inferred from the claim text.