Delivery of configurable pulsed voltage waveforms for substrate processing

One or more non-transitory computer readable media storing executable instructions that, when executed by at least one processor, cause the at least one processor to perform operations comprising:

• applying a positive DC bias relative to ground to a first electrode disposed within a processing region of a processing chamber, wherein the positive DC bias is configured to alter a plasma potential relative to ground of a plasma formed in the processing region of the processing chamber;
• and
• delivering a pulsed-voltage (PV) waveform to a second electrode disposed in a substrate support within the processing chamber, wherein amplitudes of pulses of the PV waveform extend from a first positive voltage relative to ground to a second positive voltage relative to ground, and wherein the first positive voltage relative to ground is greater than the plasma potential relative to ground and the second positive voltage relative to ground is less than the plasma potential relative to ground.