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US 2025/0320437 A1Published application
Cleaning composition and method of forming photoresist pattern using the same
AssigneeDongwoo Fine-Chem Co., Ltd.
InventorsBAEK HYUN CHO, GI JIN KWUN, HYUNG SUB CHOI
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Abstract
A cleaning composition according to an embodiment includes an alcohol solvent and a cumene compound. The content of the cumene compound is greater than 0 and 1 ppb or less based on the total weight of the composition. The cleaning composition may exhibit improved time-dependent stability and improved cleaning performance of semiconductor substrate residues.
Claims10
A cleaning composition comprising:
- an alcohol solvent;
- and
- a cumene compound,
- wherein a content of the cumene compound is greater than 0 and 1 ppb or less based on a total weight of the composition.
1 more element
Dependencies are inferred from the claim text.