Apparatus and method for generating multi-level high voltage non-sinusoidal signal in semiconductor manufacturing equipment using plasma

A method for generating a non-sinusoidal signal by an apparatus comprising a first square wave circuit, a second square wave circuit, and a sawtooth wave circuit, the method comprising:

• applying a first positive voltage to an output terminal by the first square wave circuit;
• applying a first negative voltage to the output terminal by the second square wave circuit;
• applying a first sawtooth wave voltage to the output terminal by the sawtooth wave circuit;
• applying a second positive voltage to the output terminal by the first square wave circuit;
• applying a second negative voltage to the output terminal by the second square wave circuit;
• and
• applying a second sawtooth wave voltage to the output terminal by the sawtooth wave circuit, wherein, when the first sawtooth wave voltage or the second sawtooth wave voltage is applied, current is drawn from a capacitive load connected to the output terminal by using an inductor included in the sawtooth wave circuit.

An apparatus for manufacturing a semiconductor device comprising a non-sinusoidal signal generation apparatus and a chamber,

• wherein the non-sinusoidal signal generation apparatus comprises:
• a first square wave circuit, which can apply, to an output terminal, two positive voltages having different magnitudes;
• a second square wave circuit, which can apply, to the output terminal, two negative voltages having different magnitudes;
• and a sawtooth wave circuit, which can apply, to the output terminal, two sawtooth wave voltages having different magnitudes,
• wherein the sawtooth wave circuit comprises an inductor for drawing current from a capacitive load connected to the output terminal.