Resist composition, method for producing resist pattern and method for producing plated molded article
AssigneeSumitomo Chemical Company, Limited
InventorsMasaru HATABE, Masako SUGIHARA
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AssigneeSumitomo Chemical Company, Limited
InventorsMasaru HATABE, Masako SUGIHARA
Estimating the term…
Disclosed are a resist composition comprising a resin (A1) including a structural unit having a group represented by formula (20), an alkali-soluble resin (A2), an acid generator (B) including a compound represented by formula (b0) and a compound (C) represented by formula (I), a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern: wherein, in formula (20), Ra1′ and Ra2′ each independently represent a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, Ra3′ represents a hydrocarbon group having 1 to 20 carbon atoms, X represents an oxygen atom, etc., na′ represents 0 or 1, and * represents a bond: wherein, in formula (b0), Rb1 represents a hydrocarbon group having 1 to 18 carbon atoms which may have a fluorine atom, X represents an oxygen atom, etc., R01 represents a hydrocarbon group having 1 to 18 carbon atoms, and x0 represents an integer of 1 to 6, and: wherein, in formula (I), ring W1 represents a heterocyclic ring having a nitrogen atom as atoms constituting the ring, etc., A1 represents a phenyl group, etc., and n represents 2 or 3.
A resist composition comprising a resin (A1) including a structural unit having a group represented by formula (20), an alkali-soluble resin (A2), an acid generator (B) including a compound represented by formula (b0), and a compound (C) represented by formula (I):
Dependencies are inferred from the claim text.