Apparatus of processing a substrate

An apparatus of processing a substrate, comprising:

• a cup unit having a treatment space therein;
• a supporting unit supporting and rotating a substrate in the treatment space;
• a liquid supply unit provided to supply a treatment liquid selected from a plurality of treatment liquids to a substrate supported on the supporting unit;
• and
• an exhaust unit exhausting the treatment space,
• wherein the cup unit comprises:
• a recovery bath recovering the treatment liquid;
• and
• a guide cup guiding the treatment liquid to the recovery bath,
• the recovery bath provides a recovery space,
• a passage through which gas is exhausted is formed further inside than the recovery bath,
• the exhaust unit comprises an exhaust bath disposed under the cup unit and provided in a ring shape along the passage, and an exhaust pipe connected to the exhaust bath,
• the exhaust bath has a buffer space therein, and
• an arc-shaped guide plate is provided in the buffer space.

An apparatus of processing a substrate, comprising:

• a cup unit having a treatment space therein;
• a supporting unit supporting and rotating a substrate in the treatment space;
• a liquid supply unit provided to supply a treatment liquid selected from a plurality of treatment liquids to a substrate supported on the supporting unit;
• an elevation unit adjusting a relative height between the cup unit and the supporting unit;
• and
• an exhaust unit exhausting the treatment space,
• wherein the cup unit comprises:
• a first drain bath provided to surround an actuating shaft of the supporting unit and having a first recovery space to which a treatment is recovered;
• a first drain pipe coupled to the first drain bath to discharge the treatment liquid recovered in the first recovery space;
• a second drain bath provided to surround the first drain bath and having a second recovery space to which a treatment is recovered;
• a second drain pipe coupled to the second drain bath to discharge the treatment liquid recovered in the second recovery space;
• a first guide cup having a first inner surface guiding a treatment liquid, which is splashed from a substrate supported on the supporting unit, to the first drain bath;
• and
• a second guide cup provided to be surrounded by the first guide cup and having a second inner surface guiding a treatment liquid, which is splashed from a substrate supported on the supporting unit, to the second drain bath,
• the elevation unit adjusts a relative height between the first guide cup and the second guide cup,
• when the first guide cup or the second guide cup is moved up, an outer wall of the first drain bath or an outer wall of the second drain bath extends farther than an inner wall of the first drain bath or an inner wall of the second drain bath such that a lower end of the first guide cup or the second guide cup is maintained in contact with the outer wall of the first drain bath or the outer wall of the second drain bath,
• the exhaust unit comprises:
• a first exhaust bath disposed under the cup unit and having a first buffer space into which airflow flowing through a first passage, which is provided between an inner surface of the first guide cup and an outer surface of the second guide cup, flows;
• a first exhaust pipe connected to the first drain bath to discharge the airflow flowing in the first buffer space;
• a second exhaust bath disposed under the cup unit and having a second buffer space into which airflow flowing through a second passage, which is provided to be surrounded by the first exhaust bath when seen from above and is provided inside the second guide cup, flows;
• and
• a second exhaust pipe connected to the second exhaust bath to discharge the airflow flowing in the second buffer space,
• a first connection channel connecting the first passage and the first buffer space is positioned between the first drain bath and the second drain bath, and
• a second connection channel connecting the second passage and the second buffer space is positioned inside the second drain bath,
• an arc-shaped guide plate is provided in the first buffer space,
• the first exhaust pipe is connected to the first exhaust bath at the center of the area covered by the guide plate when seen from above,
• the guide plate is positioned higher than a height at which the first exhaust pipe is connected to the first exhaust bath, and
• the farther from the point at which the first exhaust pipe is connected to the first exhaust bath, the smaller the width of the guide plate when seen from above.